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Large-scale soft-lithographic patterning of plasmonic nanoparticles

Abstract: Micro- and nanoscale patterned monolayers of plasmonic nanoparticles were fabricated by combining concepts from colloidal chemistry, self-assembly, and subtractive soft lithography. Leveraging chemical interactions between the capping ligands of pre-synthesized gold colloids and a polydimethylsiloxane stamp, we demonstrated patterning gold nanoparticles over centimeter-scale areas with a variety of micro- and nanoscale geometries, including islands, lines, and chiral structures (e.g., square spirals). By successfully achieving nanoscale manipulation over a wide range of substrates and patterns, we established a powerful and straightforward strategy, nanoparticle chemical lift-off lithography (NP-CLL), for the economical and scalable fabrication of functional plasmonic materials with colloidal nanoparticles as building blocks, offering a transformative solution for designing next-generation plasmonic technologies.

 Fuente: ACS Materials Letters, 2021, 3(3), 282-289

 Editorial: American Chemical Society

 Fecha de publicación: 12/02/2021

 Nº de páginas: 8

 Tipo de publicación: Artículo de Revista

 DOI: 10.1021/acsmaterialslett.0c00535

 ISSN: 2639-4979

 Proyecto español: PID2019-106860GB-I00

Autoría

CHIANG, NAIHAO

VINNACOMBE-WILLSON, GAIL A.

PÉREZ, LUIS A.

DORE, CAMILLA

MIHI, AGUSTÍN

JONAS, STEVEN J.

WEISS, PAUL S.